The AutoGlow plasma cleaning system has a quartz chamber and a variable 10-300 watt 13.56 MHz solid state generator. The system provides very efficient plasma for lab and production applications with automatic tuning. Adjust power in one watt increments. For use with O2, Ar or N2 gas.
The OptiGlow 75 is used for Plasma Surface Modification, Plasma Treatment and Surface Activation. The OptiGlow ACE has an anodized aluminum chamber and is used for failure analysis, removing photoresist, cleaning organics, etching Parylene, surface treatment and other applications. RIE or Plasma processing using O2, Ar or CF4.
The Glow Research ST1200 Plasma System delivers high end RIE anisotropic etching of silicon nitride (Si3N4), silicon oxide (SiO2), silicide, III-V compounds, polyimide and photo resist removal. The ST1200 can provide a wide variety of etch profiles ranging from anisotropic to sloped walls.
Glow Research makes plasma cleaning systems that are easy to use, extremely reliable and produce a plasma that will allow the user to easily complete the plasma process with the best results possible. Glow Research makes the entire system (RF generator, RF matching, control system, chamber and gas flow modules). Our systems are used in 3 shift/day production as well university/R&D applications. Our systems allow our Customer to attend to work they need to accomplish with the support of a reliable plasma cleaning or etching system.
Glow Research has taken over the world-wide responsibility for parts and service for several older units from Nordson MARCH (March Plasmod, March Super Plasmod, March PM-600 and March Jupiter RIE systems). Take a look at what rebuilt systems we have to offer.
941 South Park Lane | Tempe, AZ 85281 USA
USA - 480-621-8405