Plasma Cleaners, Plasma Etchers, Plasma Ashers, RIE Plasma, and Sputter Deposition systems are provided by Glow Research.   Our systems are used for plasma cleaning, decap, pre-bonding (PDMS), surface modification, organic removal, photoresist removal and FA applications.

Our higher purpose: Provide reasonably priced and extremely reliable plasma systems for our Customers–so they can carry out their good work with repeatable results, and with the reliability of plasma systems that normally are very expensive.  We want our Customers to focus on their research or production.  At Glow Research we are extremely proud that our systems have contributed to advancements in the Scientific community, MEMS, Biomedical and the Semiconductor industry.

Glow Research manufactures  AutoGlow plasma systems, OptiGlow plasma systems and SputterGlow sputter deposition (PVD) systems.    Glow Research will process free samples for Customers that need to verify process results–or provide demo systems to help meet various needs.

Customer Comment: “I wanted to let you know our systems are all running like champs, all 3 have already paid for themselves.”–Brent Shepherd, MicroSemi Corp

Brent Shepard has been using our AutoGlow type system in a production environment (two shifts/day).  The quartz chamber system is used to remove photoresist and achieves a removal rate of 1,600 Angstroms per minute with a load of 25 wafers per run.

Capability: Glow Research is one of the only plasma equipment companies that manufactures the entire system….the RF generators, match networks, control systems and chambers.  This allows Glow Research to provide extremely reliable plasma systems at a price below our competitors.   Our systems are used in labs, universities and productions lines worldwide.   Glow Research also makes plasma systems under private label for other plasma companies.  Glow Research plasma systems tune automatically, and generate a very uniform plasma.  Unlike other less expensive plasma systems on the market….Glow Research plasma systems do not ark or spark, and tune fast without excessive reflected power.

Choice of Systems:

OptiGlow—uses room air as the process gas, 50 watts, 100 kHz, aluminum chamber.  For surface modification.   Our lowest priced system under $9,600.  Table top system.

OptiGlow 75—for use with oxygen or argon (and other gas), 75 watts, 100 kHz, anodized aluminum chamber.  For surface modification, plasma cleaning, prebond treatment.  Table top system.

OptiGlow ACE—for use with oxygen, argon or fluorine (CF4) type gas.  Two gas flowmeters, anodized aluminum chamber, variable 10 to 150 watt 13.56 MHz RF generator, autotune.  RIE or plasma processing.  For ashing, cleaning and etching(ACE).  Ideal for removing layers for Failure Analysis, or etching a variety of films.  Table top system.  Common use is for Decap, plasma cleaning and Etching.

AutoGlow—Up to three gases–oxygen, argon or other gases, quartz chamber, 6” substrates, variable 10 to 300 watt 13.56 MHz RF generator, autotune.  Capacitive coupled, push button automatic operation.  Used for plasma cleaning, prebond, etching  films, removing organics, removing photoresist.  Table top system.

AutoGlow 200—can process 200 mm substrates (or 8” wafers).  RIE or plasma processing.  Up to three gases–oxygen, argon or fluorine (CF4) type gas, variable 10 to 300 watt 13.56 MHz RF generator, autotune, anodized aluminum chamber.  Used for plasma cleaning, activation, prebond, etching, removing organics, removing photoresist.

AutoGlow Plasma Systems

Plasma Cleaner.  This table-top system can be used at low power of 10 watts or up to 300 watts, 13.56 MHz solid state generator, automatic tuning, pressure read-out, nitrogen purge, soft venting, three gas inputs and is CE marked.  Perfect for treating PDMS, organic removal or photo-resist removal.  Has a quartz chamber and can process up to 6″ (150 mm) substrates.

Larger AutoGlow systems are available with anodized aluminum chambers to fit Customer’s requirements (RIE or Plasma processing).   Pictured below is a AutoGlow 200.  Designed for up to 200 mm (8″) substrates or wafers, CF4, O2 or Ar gas, the system can be used for RIE or plasma processing depending on the sample carrier you use.  It has an anodized aluminum chamber and can be used for etching, ashing or surface modification.

Find out more about our AutoGlow Plasma Systems

OptiGlow Plasma Systems

The OptiGlow ACE is designed to perform Plasma Ashing, Cleaning or Etching (ACE) at 13.56 MHz.  The OptiGlow ACE has two gas inputs and can be use with air, oxygen, or CF4 type gases.  It has an anodized aluminum chamber and can be used for either RIE or Plasma processing.  Great for a long process and removing layers on packages or semiconductor chips.  Used for Failure Analysis, removing photoresist, cleaning organics, etching Parylene, surface treatment and a host of other applications.

The standard OptiGlow system is used for Plasma Surface Modification and Plasma Treatment, Surface Activation. Priced under $10,500 (USD), the sturdy, table-top OptiGlow plasma system is perfect for production or lab applications. Easy to use with a display for chamber pressure and module status. 

The OptiGlow system is the first low cost plasma system that can be used for increasing the wettability and comfort of contact lenses. The OptiGlow plasma system is also ideal for use prior to coating, laminating and deposition processes, and is highly effective at treating a wide range of substrates or material.

The OptiGlow 75 plasma system is similar to the standard OptiGlow and has an anodized aluminum chamber, 75 watts of power and the option to use up to two input gases, such as oxygen or argon.Can be used for organic removal and stripping photoresist.

Find out more about our OptiGlow Plasma Systems

SputterGlow Sputter Deposition System

A perfect choice to deposit a wide range of dielectrics or metals, with up to three targets.  Originally designed to deposit Si₃N₄anti-reflective coatings on solar cells as an alternative to using PECVD–because the SputterGlow process does not require dangerous gases such as SiH₄ for nitride deposition.  The system has stepper robotics, heated stations, and is controlled with a lap-top computer.

Depending on your need, the proprietary planar magnetron generates a plasma with either low or high power.  The SputterGlow was designed to ensure process vacuum integrity and utilize an aluminum chamber (to keep cost down).

Find out more about SputterGlow

Rebuilt Systems

Glow Research has taken over the world-wide responsibility for parts and service for several older units from Nordson MARCH (March Plasmod, March Super Plasmod, March PM-600 and March Jupiter RIE systems).  Take a look at what rebuilt systems we have to offer.