AutoGlow Plasma Systems

The AutoGlow plasma system is a tabletop plasma chemistry reactor designed to provide the medical, scientific, educational and the production microelectronics community with plasma technology at a moderate cost. The system is used in production as well as R&D centers.  Used for argon plasma, oxygen plasma, plasma coating, PDMS, oxygen plasma treatment, photo resist stripping, FA applications, Parylene removal, organic removal and lab use.

Universities and  companies worldwide find the AutoGlow plasma system the perfect fit for their plasma needs.

The AutoGlow plasma system is the most efficient system of its kind on the market because of its variable 10 Watt to 300 Watt, 13.56 MHz solid state generator. The AutoGlow plasma system is also designed to efficiently breakdown gases introduced to the system creating reactive species that will quickly clean or modify the sample.  Automatic tuning and a pressure readout are included.  The AutoGlow can strike a plasma as low as 10 Watts!!

Automatic/push-button operation. 

Glow Research has taken the best designs of the old systems, and updated the AutoGlow plasma system with current technology, including our proprietary phase magnitude detector and SimpleMatch RF network that allows efficient plasma tuning and provides quick processing without the trouble of constantly adjusting to various sample loads. The AutoGlow is very reliable and has a TWO YEAR WARRANTY!  Easily replaceble Modules in the system are: RF Generator, RF Match Network, Face Plate Module (see below), Quartz Chamber and Gas Control Module.  For more data and information, please click on the “AutoGlow Features” to the right on this page.

Here is what a recent Customer had to say about their AutoGlow:  “Everything is working fine.  It just chugs along as it should.   I’m impressed we can almost fully ash AZ4620 resist at 125W in a few minutes.  I’ve got someone also using it for pretreatment of PDMS prior to bonding.  Works great for that.”
 
The AutoGlow 200 system is designed for up to 200 mm substrates or 8″ wafers, and can perform RIE or plasma processing–depending on which sample carrier used.  The anodized aluminum chamber can accomidate standard O2, Ar or CF4 type gases for etching applications.  The well proven electronic, RF generator, match network and gas control is the same as the standard AutoGlow above.  Please contact Glow Research for more information on the AutoGlow 200.  
The AutoGlow 200 has the same status diagnostic card as the AutoGlow which confirms that all sub-modules are working correctly.  The system to the right  is
shown with the optional nitrogen chamber vent purge.  
The AutoGlow 200 can be used for a varity of applications from plasma activation, cleaning, organic removal,  pre-deposition cleaning as well as a variety of etching applications. 
 
 
 
 
 
 
 

MIT has an AutoGlow in the Stata Center that is used for various biomedical and microfluidics research. Pictured is a Geraldine Paulus, a doctoral student in charge of the AutoGlow at MIT Building 66 (Landau Building Lab).

 
 
 

"Rice University has an AutoGlow in the Halas Research Lab. The system is used for removal of polymer resists for applications in plasmonics and nanophotonics. Pictured is Lisa Brown, a doctoral student who uses the AutoGlow to prepare samples for surface-enhanced molecular spectroscopy."

 

 

Harvard University’s AutoGlow system in the Gordon McKay Lab. The system is used for organic removal, surface modification and serves the needs of several researchers working on DNA research and human genome sequencing. Pictured is Gordon Whitlock, President of Glow Research.

Pictured is the AutoGlow at the Microsystems Technology Lab at MIT. This AutoGlow is used for photoresist removal, cleaning and surface modification. This lab does research in MEMS, BioMEMS, Nanotechnology and Photonics.