Stripping of Photoresist

The AutoGlow plasma system can be used for stripping of photoresist. Most users use an oxygen plasma to remove photoresist from a variety of wafers types (silicon, GaAs, silicon carbide, silicon nitride substrates). The AutoGlow plasma system’s automated design will allow easy and unattended operation.

Low temperature ashing is an effective means of preparing samples for a wide variety of analytical methods. An oxygen plasma will gently oxidize organic material leaving inorganics behind. Samples such as plant or animal tissue can be ashed leaving the three dimensional structure intact for analysis microscopy. Ashing rates are about one gram per hour, so the AutoGlow plasma system auto-tune feature is well suited for unattended operation. The AutoGlow plasma system can be used for cleaning transmission cells, windows and microscope slides.